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361514

Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.

Article

Last updated: 08 Feb 2025

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Subjects

-

Tags

Physical chemistry

Abstract

In this work, magnetron sputtered Ti and Al2O3/Ti have been investigated. Microstructure, morphology, phase identification, mechanical, and optical properties were studied. Heat treatment at 600◦ C for 2h with different cooling rates was applied. X-ray diffraction (XRD) was used in phase and structure identification. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used for microstructure and morphology investigations. Microhardness is used for mechanical properties measurements. The FTIR and spectrophotometry were used for optical characterizations. It was found that the Al2O3/Ti structure has a higher hardness value at all conditions compared to Ti. Resulted in TiO2 phases after heat treatment varying due to the cooling rate. As deposited Al2O3/Ti structure has the highest selectivity value (absorbance/emittance). Al2O3/Ti structure has a higher selectivity value at all conditions than Ti.

DOI

10.21608/ejchem.2024.275380.9420

Keywords

Physical vapor deposition, Thin film, Selective absorber, Titanium, aluminum oxide, Thermal solar energy

Authors

First Name

Hanan

Last Name

Abd El Fattah

MiddleName

-

Affiliation

Chemical Engineering Department, Canal High Institute of Engineering and Technology, Suez, Egypt

Email

enghanannn@gmail.com

City

-

Orcid

-

First Name

Aliaa

Last Name

Abdelfatah

MiddleName

-

Affiliation

Mining, Petroleum, and Metallurgical Engineering Department, Faculty of Engineering, Cairo University, Giza, 12613, Egypt

Email

aliaaabdelfatah@eng.cu.edu.eg

City

-

Orcid

-

First Name

Iman

Last Name

Elmahallawi

MiddleName

-

Affiliation

The Centre for Renewable Energy, The British University in Egypt, El Shorouk, Cairo, Egypt , Faculty of Postgraduate Studies for Nanotechnology, Cairo University, Egypt

Email

ielmahallawi@bue.edu.eg

City

-

Orcid

-

First Name

Ahmed

Last Name

Ibrahim

MiddleName

-

Affiliation

Faculty of Postgraduate Studies for Nanotechnology, Cairo University, Egypt

Email

ahmed_chemi2012@yahoo.com

City

-

Orcid

-

First Name

Lamiaa

Last Name

Mohamed

MiddleName

Z.

Affiliation

Mining, Petroleum, and Metallurgical Engineering Department, Faculty of Engineering, Cairo University, Giza, 12613, Egypt

Email

lamiaa.zaky@cu.edu.eg

City

Cairo

Orcid

0000-0003-0731-753X

Volume

68

Article Issue

2

Related Issue

53637

Issue Date

2025-02-01

Receive Date

2024-03-07

Publish Date

2025-02-01

Page Start

27

Page End

37

Print ISSN

0449-2285

Online ISSN

2357-0245

Article File

EJCHEM_Volume 68_Issue 2_Pages 27-37.pdf

PDF . 465.1kB

Link

https://ejchem.journals.ekb.eg/article_361514.html

Detail API

http://journals.ekb.eg?_action=service&article_code=361514

Order

361,514

Type

Original Article

Type Code

297

Publication Type

Journal

Publication Title

Egyptian Journal of Chemistry

Publication Link

https://ejchem.journals.ekb.eg/

MainTitle

Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.

Details

Type

Article

Created At

08 Feb 2025