Comparison between the optical properties of TiO2 and ZnO thin films deposited using Dc plasma sputtering and pulsed laser deposition
Last updated: 29 Dec 2024
10.21608/jbes.2024.370411
optical films, Zinc Oxide, Titanium oxide, plasma deposition. Laser deposition
A. A.
Salih
Ministry of Electricity, Iraq
M. H.
Makled
Depertment of physics, Faculty of science, Benha University, P. O. Box13518 Benha, Egypt
T. Y.
Elrsasi
Depertment of physics, Faculty of science, Benha University, P. O. Box13518 Benha, Egypt
M. A.
Hassoba
Depertment of physics, Faculty of science, Benha University, P. O. Box13518 Benha, Egypt
G. A.
Al-Dahash
Department of physics, Faculty of science, Babylon University, Babylon, Iraq
5
2
49518
2018-04-01
2024-07-28
2024-04-01
93
100
2536-9202
2356-6388
https://jbes.journals.ekb.eg/article_370411.html
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370,411
Original Article
3,063
Journal
Journal of Basic and Environmental Sciences
https://jbes.journals.ekb.eg/
Comparison between the optical properties of TiO2 and ZnO thin films deposited using Dc plasma sputtering and pulsed laser deposition
Details
Type
Article
Created At
21 Dec 2024