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221401

EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE

Article

Last updated: 05 Jan 2025

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Subjects

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Tags

Physics

Abstract

Titanium dioxide (TiO2) has attracted much attention in the past decades. TiO2 thin films were prepared using vacuum thermal evaporation technique and then heat treated at different annealing temperatures. An optical characterization method, based only on the transmission spectra at normal incidence of uniform thin films, was used to obtain the refractive index n.   The dispersion of n is discussed in terms of the single-oscillator Wemple and DiDomenico model. The dispersion parameters,  and  decreases after annealing at different temperatures for 3h. The obtained results were discussed in terms of an increasing the packing density of the deposited films after annealing treatment.

DOI

10.21608/aunj.2017.221401

Keywords

Thin films, Oxide semiconductor, Titanium dioxide, refractive index

Volume

46

Article Issue

1

Related Issue

31576

Issue Date

2017-06-01

Receive Date

2022-02-23

Publish Date

2017-06-01

Page Start

1

Page End

10

Print ISSN

2812-5029

Online ISSN

2812-5037

Article File

AUNJ_Volume 46_Issue 1_Pages 1-10.pdf

PDF . 491.5kB

Link

https://aunj.journals.ekb.eg/article_221401.html

Detail API

https://aunj.journals.ekb.eg/service?article_code=221401

Order

221,401

Type

Novel Research Articles

Type Code

2,242

Publication Type

Journal

Publication Title

Assiut University Journal of Multidisciplinary Scientific Research

Publication Link

https://aunj.journals.ekb.eg/

MainTitle

EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE

Details

Type

Article

Created At

23 Jan 2023