Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution
Last updated: 28 Dec 2024
10.18576/jpac/030302
Nucleation, silicon dioxide nanoparticles, Transmission electron microscopy, IR spectroscopy, tetraethoxysilane
T.
Pavliashvili
Institute of Micro-and Nanoelectronics, 13 Ilia Chavchavadze Avenue, 0179, Tbilisi, Georgia.
A.
Tutunjyan
Institute of Micro-and Nanoelectronics, 13 Ilia Chavchavadze Avenue, 0179, Tbilisi, Georgia.
Z.
Akhvlediani
I.Javakhishvili Tbilisi State University, 3 Ilia Chavchavadze Avenue, 0128, Tbilisi, Georgia.
G.
Tsertsvadze
Georgian Technical University, 77Merab Kostava Avenue, 0175 Tbilisi, Georgia.
3
2
28515
2017-09-01
2021-10-31
2017-09-01
14
16
2357-0210
https://jpac.journals.ekb.eg/article_202346.html
https://jpac.journals.ekb.eg/service?article_code=202346
202,346
Original Article
2,018
Journal
Journal of Pharmaceutical and Applied Chemistry
https://jpac.journals.ekb.eg/
Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution
Details
Type
Article
Created At
23 Jan 2023