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202346

Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution

Article

Last updated: 28 Dec 2024

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Tags

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Abstract

The nucleation process of silicon dioxide nanoparticles in tetraethoxysilane solutions is studied. For the investigation, infrared spectrometry, optical and transmission electron microscopy was used. Size distribution of nanoparticles was determined and corresponding histograms were plotted.

DOI

10.18576/jpac/030302

Keywords

Nucleation, silicon dioxide nanoparticles, Transmission electron microscopy, IR spectroscopy, tetraethoxysilane

Authors

First Name

T.

Last Name

Pavliashvili

MiddleName

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Affiliation

Institute of Micro-and Nanoelectronics, 13 Ilia Chavchavadze Avenue, 0179, Tbilisi, Georgia.

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First Name

A.

Last Name

Tutunjyan

MiddleName

-

Affiliation

Institute of Micro-and Nanoelectronics, 13 Ilia Chavchavadze Avenue, 0179, Tbilisi, Georgia.

Email

-

City

-

Orcid

-

First Name

Z.

Last Name

Akhvlediani

MiddleName

-

Affiliation

I.Javakhishvili Tbilisi State University, 3 Ilia Chavchavadze Avenue, 0128, Tbilisi, Georgia.

Email

-

City

-

Orcid

-

First Name

G.

Last Name

Tsertsvadze

MiddleName

-

Affiliation

Georgian Technical University, 77Merab Kostava Avenue, 0175 Tbilisi, Georgia.

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-

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Orcid

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Volume

3

Article Issue

2

Related Issue

28515

Issue Date

2017-09-01

Receive Date

2021-10-31

Publish Date

2017-09-01

Page Start

14

Page End

16

Online ISSN

2357-0210

Link

https://jpac.journals.ekb.eg/article_202346.html

Detail API

https://jpac.journals.ekb.eg/service?article_code=202346

Order

202,346

Type

Original Article

Type Code

2,018

Publication Type

Journal

Publication Title

Journal of Pharmaceutical and Applied Chemistry

Publication Link

https://jpac.journals.ekb.eg/

MainTitle

Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution

Details

Type

Article

Created At

23 Jan 2023