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148856

Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film

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Last updated: 05 Jan 2025

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Abstract

An enhancement of structural, optical and electrical properties of tin
oxide thin films could be obtained by exposing these films to DC pseudo
nitrogen plasma. The films were prepared by spray pyrolysis method, and then
the properties are measured at different exposure times of plasma. It is found
that the exposure time (~ 15 minutes) enhances the transmittance of the tin
oxide while larger times decrease it. Also, it is found that; there is a dramatic
change in thickness, optical band gap and the resistivity with changing the
exposure time.

DOI

10.21608/ejs.2011.148856

Volume

34

Article Issue

1

Related Issue

21881

Issue Date

2011-12-01

Receive Date

2010-04-16

Publish Date

2011-12-01

Page Start

7

Page End

18

Print ISSN

1012-5566

Online ISSN

2735-5640

Link

https://ejs.journals.ekb.eg/article_148856.html

Detail API

https://ejs.journals.ekb.eg/service?article_code=148856

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Journal

Publication Title

Egyptian Journal of Solids

Publication Link

https://ejs.journals.ekb.eg/

MainTitle

Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film

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Article

Created At

23 Jan 2023