A thin film can be applied to a wide variety of microelectronic devices, sensors, anti-reflective and protective coatings, transparent electrodes, etc. It increases the efficiency and versatility of the equipment. The nanostructured particles of zinc oxide (ZnO) were synthesized using a microwave method with an average grain size of 25.7 nm. High-quality ZnO thin films are being deposited using the Pulsed Laser Deposition (PLD) technique at room temperature, one of the most advanced Physical Vapor Deposition techniques. After one hour of air annealing at 400 °C, grazing incident X-ray diffractometer (GIXRD) confirms polycrystalline hexagonal wurtzite formation with an average grain size of 7.7 nm. The transmission spectrum indicates high transparency in the visible region, with an average value of 95%. The calculated activation energy and dc conductivity were 32 meV and 950 Ω-1.m-1, respectively. The highly transparent-conductive ZnO thin film may present a new avenue for electrodes with transparent conductivity.