A novel thin-film power MOSFET with an asymmetrical buried oxide double step structure
Last updated: 04 Jan 2025
10.21608/iceeng.2008.34313
Silicon-on-insulator (SOI), Power MOSFET, Breakdown Voltage, Buried Oxide Double Step Structure
Ali
Orouji
A.
Electrical Engineering Department, Semnan University, Semnan, IRAN.
Samaneh
Sharbati
Electrical Engineering Department, Semnan University, Semnan, IRAN.
Morteza
Fathipour
Electrical Engineering Department, Tehran University, Tehran, IRAN.
6
6th International Conference on Electrical Engineering ICEENG 2008
5700
2008-05-01
2019-06-11
2008-05-01
1
7
2636-4433
2636-4441
https://iceeng.journals.ekb.eg/article_34313.html
https://iceeng.journals.ekb.eg/service?article_code=34313
73
Original Article
833
Journal
The International Conference on Electrical Engineering
https://iceeng.journals.ekb.eg/
A novel thin-film power MOSFET with an asymmetrical buried oxide double step structure
Details
Type
Article
Created At
22 Jan 2023