25834

DIFFUSION PROCESS IN A TRANSISTOR USING THE BOUNDARY ELEMENT METHOD

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Last updated: 04 Jan 2025

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Abstract

The diffusion process in a transistor is simulated by two partial differential equations: Laplace's and Poisson's. The proposed solution consists in an iterative scheme for a determination of the interface between these two equations.The first one consists in the use of an adjoint potential for the reduction of the domain to the boundary integral. The second method consists in a an analytical reduction of the domain integral and a numerical evaluation of the boundary integral using Simpson's rule and Gauss quadrature scheme. The two methods are applied to a free boundary value problem : A Junction Gate Field Effect Transistor. The results obtained are analysed and compared.

DOI

10.21608/asat.1991.25834

Authors

First Name

M.

Last Name

Kassem

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Affiliation

Assistant Professor,Faculty of Engineering. Math & Physics Dept. Zagazig University.

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First Name

H.

Last Name

SoLiman

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Affiliation

Demonstrator, Faculty of Engineering. Math & Physics Dept. Zagazig University.

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Volume

4

Article Issue

ASAT CONFLENCE 14-16 May 1991 , CAIRO

Related Issue

4667

Issue Date

1991-05-01

Receive Date

2019-01-23

Publish Date

1991-05-01

Page Start

515

Page End

525

Print ISSN

2090-0678

Online ISSN

2636-364X

Link

https://asat.journals.ekb.eg/article_25834.html

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https://asat.journals.ekb.eg/service?article_code=25834

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45

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Original Article

Type Code

737

Publication Type

Journal

Publication Title

International Conference on Aerospace Sciences and Aviation Technology

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https://asat.journals.ekb.eg/

MainTitle

DIFFUSION PROCESS IN A TRANSISTOR USING THE BOUNDARY ELEMENT METHOD

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Article

Created At

22 Jan 2023